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VACUUBRAND Chemistry Diaphragm Pump ME 4C NT, One Stage, Certification: (NRTL): C/US100 to 115 V / 50 to 60 Hz, 120 V / 60 Hz, US Mains Cable

Plug type

Specifications

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Depth
254 mm
Dimensions (WxDxH)
243 x 254 x 198 mm
Flow rate
3.9 m³/h
Height
198 mm
No. of stages
1
Plug type
US
Type
ME 4C NT
Ultimate vacuum
70 mbar
UNSPSC
40151502
Width
243 mm

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NTD 111,647

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Product description

The VACUUBRAND Chemistry Diaphragm Pump ME 4C NT, one-stage, certification: (NRTL): C/US, 100-115 V / 50-60 Hz, 120 V / 60 Hz, US Mains Cable is a diaphragm vacuum pump from VACUUBRAND designed for oil-free evacuation and pumping of gases or vapours. Improved performance, increased pumping speed and lower ultimate vacuum extends applications in both the laboratory and in industrial applications. Its documented configuration includes electrical supply: 115 V, 120 V, 50-60 Hz, 60 Hz, connection: US Mains Cable, and pump design: One-Stage.

Key Features:

  • Brand: VACUUBRAND
  • Model: ME 4C NT
  • Product Type: Diaphragm Vacuum Pump
  • Electrical Supply: 115 V, 120 V, 50-60 Hz, 60 Hz
  • Connection: US Mains Cable
  • Pump Design: One-Stage
  • Pumping Performance: Improved performance, increased pumping speed and lower ultimate vacuum extends applications in both the laboratory and in industrial applications
  • Diaphragm Construction: Long-life diaphragm with PTFE sandwich construction and unstressed diaphragm support
  • Maintenance: Easy service/exchange of diaphragm or valves due to novel integrated valve head assembly; Easy dismantling, cleaning and reassembly without requiring readjustment
  • Noise and Vibration: Very quiet and ultra low vibration due to compact drive with patented motor control system. Ideal as a built-in component for sensitive equipment in both the laboratory and in industry
  • Surface Design: Easy to clean due to smooth exterior surfaces

The VACUUBRAND Chemistry Diaphragm Pump ME 4C NT, one-stage, certification: (NRTL): C/US, 100-115 V / 50-60 Hz, 120 V / 60 Hz, US Mains Cable supports oil-free evacuation and pumping of gases or vapours where the stated configuration is required. Confirm process compatibility, wetted materials, electrical supply, connections, and included components before ordering.

Accessories

Sealing kit NT for chemistry diaphragm pumps NT

ProductForUNSPSCMfr#Part#AvailabilityPrice
MZ 2C NT40151502206968696.241 476NTD 13,509
MD 4C NT40151502206968706.239 489NTD 25,754
ME 4 NT, MZ 2 NT40151502206968609.880 902NTD 7,368
ME 4C NT40151502206968649.880 906NTD 7,838
MZ 2D NT40151502206968639.880 904NTD 7,368
MV 2 NT / MD 4 NT40151502206968619.880 905NTD 13,039
ME 8 NT40151502206968629.880 903NTD 10,764
ME 8C NT40151502206968679.880 907NTD 15,243

Vacuum tubings, PVC

ProductMaterialExt. ØMfr#Part#AvailabilityPrice
PVC15.9 mm206860604.714 081NTD 3,973
PVC34.9 mm206860634.714 084NTD 10,114
PVC38.1 mm206860654.714 085NTD 11,811
PVC15.9 mm206860614.714 082NTD 4,659
PVC22.3 mm206860624.714 083NTD 5,526

Compare similar models

Chemistry diaphragm pump ME 4C NT, one stage, certification: (NRTL): C/US100-115 V / 50-60 Hz, 120 V / 60 Hz, US mains cable

Manufacturer P/N

20731203

Part Number

4.670 426

Manufacturer

VACUUBRAND​

Plug type

US

Chemistry diaphragm pump ME 4C NT one-stage, 230 V~ 50 Hz plug CEE

Manufacturer P/N

20731200

Part Number

9.880 894

Manufacturer

VACUUBRAND​

Plug type

EU

Chemistry diaphragm pump ME 4C NT one-stage, 230 V~ 50 Hz plug CH

Manufacturer P/N

20731201

Part Number

9.880 895

Manufacturer

VACUUBRAND​

Plug type

CH

Chemistry diaphragm pump ME 4C NT, one stage, certification (NRTL): C/US230 V / 50-60 Hz, UK/IN mains cable

Manufacturer P/N

20731202

Part Number

4.670 425

Manufacturer

VACUUBRAND​

Plug type

UK

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Diaphragm pumps chemistry design, ME 1C

ProductPlug typeTypeMfr#Part#AvailabilityPrice
EUME 1C207211009.880 934In stockNTD 51,146
UKME 1C207211029.880 936NTD 51,146
CHME 1C207211019.880 935NTD 51,146
USME 1C207211039.880 937NTD 51,146

Frequently asked questions

It is a diaphragm vacuum pump from VACUUBRAND designed for oil-free evacuation and pumping of gases or vapours. Improved performance, increased pumping speed and lower ultimate vacuum extends applications in both the laboratory and in industrial applications.

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NTD 111,647

Inc. VAT